Industry Article underlying a major challenge in MRAM manufacturing
Paris – 11/24/2020
Article from KLA Jeffrey F. Barnum, published by Semiconductor Engineering.
KLA is underlying here a major challenge in MRAM’ scale-up “Even a few missing atoms can significantly affect RA and TMR”. The precise control of material quality, crucial for MRAM manufacturing, is at the heart of Spin-Ion’s activity. Spin-Ion Technologies provides an innovative ion beam process to improve MRAM materials at the atomic scale.
We invite you to read the article here, and also discover what Spin-Ion Technologies is doing to improve MRAM materials.